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on the other hand
SEMI 3D8-0514 (first published)
4 This Guide is designed to provide definitions for describing a more suitable measurement strategy for low stiffness wafers and geometries
This Document is intended for TSVs in silicon
NOTICE: This translation is a REFERENCE COPY ONLY
C02300 - SEMI C23 - Specification for Buffered Oxide Etchants SEMIViews on the other handThe purpose of this Specification is to standardize requirements for buffered oxide etchants used in the semiconductor industry and testing procedures to support those standards. Test methods have been shown to give statistically valid results. Alternative methods may be used as long as they comply with SEMI C1 requirements for method validation. The scope of this Specification is grades of buffered oxide etchants used in the semiconductor industry.
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